Overview
The goal of the Nanopatterning Cleanroom is to provide researchers access to a state-of-the-art facility to meet their nano-scale fabrication challenges. Therefore, e-beam lithography is at the heart of our NPC user facility as the technology provides versatile, effective and economic solutions. NPC offers three e-beam lithography systems that serve varying needs with the main difference being the accelerating voltages: two 100 kV Raith EBPG 5200+ systems, and 10 and 50 kV Raith Voyager. The 100 kV JEOL JBX-6300FS has been decommissioned as of October 2022 and is no longer available at SNSF.
Exposure: ZEP resist, 100 kV JEOL e-beam, 40 nm grating with ~ 8 nm lines. Image: low voltage SEM image of polymer resist at 100 kX mag. Image courtesy of Tiberio (Stanford). 
Photonic crystal crossbeam structures in GaAs. Fabrication: ZEP resist 100KV JEOL ebeam, followed by PlasmaQuest chlorine etch and HF sacrificial layer (AlGaAs) removal. Image: Low voltage SEM image. Scale bars 200, 10 and 2 microns. Sonia Buckley (Vuckovic group).
